点击此处 ,将本页翻译成中文
将本页翻译成中文
您现在的位置:首页> 外文会议>Advances in X-Ray/EUV Optics, Components, and Applications >文献详情
【6h】

Compact EUV Source and Optics for Applications apart from Lithography

【摘要】 In recent years technological developments in the area of extreme ultraviolet lithography (EUVL) have experienced great improvements. So far there are already intense light sources based on discharge or laser plasmas, light guiding and imaging optics, and detection equipment. Currently, the application of EUV radiation apart from microlithography, such as metrology, high-resolution microscopy, or surface analysis comes more and more into focus. The aim is to make use of the strong interaction between soft x-ray radiation and matter for surface-near probing, modification or structuring techniques. In this contribution, along with first applications, we present a comparison of different optical setups capable of guiding and imaging EUV radiation. A table-top EUV source based on a laser plasma was used for the experimental investigations. A modified Schwarzschild objective is adapted to this source in order to produce a focus of high energy density. The objective consists of two spherical mirrors with Mo/Si-multilayer coatings, providing a transmittance of around 42 % (reflectivity ~ 65 % @ 13.5 nm per mirror). With a demagnification of 10x a small spot is created (diameter ~ 30 μm, energy density ~ 100 mJ/cm~2), which can be used in material interaction studies. First experiments showed the potential of this setup - color centers in LiF were generated and the ablation of polymers (PMMA, polyimide) could be shown. In the latter case the influence of out-of-band radiation was determined. A sample holder with a precision translation stage allows high-resolution direct structuring. Another promising optics for guiding EUV radiation consists of two grazing incidence cylindrical mirrors (Kirkpatrick-Baez arrangement). In contrast to the Schwarzschild objective it is able to transmit over a broad spectral range, accomplishing alternative experimental techniques. A spectrally resolving reflectometer with a Kirkpatrick-Baez module as condensing optic is currently being built.

【会议名称】 Advances in X-Ray/EUV Optics, Components, and Applications

【会议地点】San DiegoCA(US)

【作者】 Armin Bayer; Frank Barkusky; Christian Peth; Holger Toettger; Klaus Mann;

【作者单位】 Laser-Laboratorium Goettingen e.V., Hans-Adolf-Krebs-Weg 1, D-37077 Goettingen, Germany;

【会议组织】

【会议召开年】 2006

【页码】P.631706.1-631706.12

【总页数】12

【原文格式】PDF

【正文语种】eng

【中图分类】O439;

【原文服务方】国家工程技术数字图书馆

【关键词】schwarzschild objective;EUV source;EUV optics;13.5 nm;laser-induced plasma;micro focus;Mo/Si;kirkpatrick-baez;

联系方式:18141920177 (微信同号)

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号