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【24h】Production Challenges of Making EUV Mask Blanks

机译制作EUV面膜毛坯的生产挑战

【摘要】Mask Blanks for EUV Lithography require a lot of new properties and features compared to standard Chrome-on-Glass blanks. Starting from completely new low thermal expansion substrate materials with significantly improved surface quality over multilayer coatings for EUV reflection, buffer layers, up to new absorber layers with improved dry etching and inspection properties. In addition highly sophisticated metrology is needed for further improvements and process control. New polishing and cleaning technologies, improved sputter technology and updated metrology enable us to routinely produce EUVL mask blanks meeting already many of the ITRS roadmap requirements. Our improvements on low defect EUV multilayer coatings as well as on our metrology methods will be elucidated and some aspects of this will be explained in detail. In addition a new design of EUVL absorber material with experimental results will be reported, including optical performance at inspection wavelength.

【摘要机译】与标准的Chrome-on-Glass毛坯相比,EUV光刻的毛坯毛坯需要许多新的特性和功能。从具有明显改善的表面质量的全新低热膨胀衬底材料开始,到用于EUV反射的多层涂层,缓冲层,再到具有改进的干法蚀刻和检查特性的新型吸收剂层。另外,还需要高度复杂的计量技术以进行进一步的改进和过程控制。新的抛光和清洁技术,改进的溅射技术和更新的计量技术使我们能够例行生产满足许多ITRS路线图要求的EUVL掩模坯料。我们将阐明我们对低缺陷EUV多层涂层的改进以及对计量方法的改进,并对其中的某些方面进行详细说明。此外,还将报告具有实验结果的EUVL吸收剂材料的新设计,包括在检测波长下的光学性能。

【作者】Holger Seitz;Frank Sobel;Markus Renno;Thomas Leutbecher;Nathalie Olschewski;Thorsten Reichardt;Ronny Walter;Hans Becker;Ute Buttgereit;Guenter Hess;Konrad Knapp;Christian Wies;Rainer Lebert;

【作者单位】SCHOTT Lithotec AG, Jerusalemer Str. 13, D-98617 Meiningen, Germany;

【年(卷),期】2005(),

【年度】2005

【页码】P.244-251

【总页数】8

【原文格式】PDF

【正文语种】eng

【中图分类】TB85;TN305.7;

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