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【24h】Pattern-induced non-uniformity of residual layers in nanoimprint lithography

机译纳米压印光刻中图案引起的残留层不均匀性

【摘要】Imprint processes into thin layers can be described by the equations of squeezed flow. In case they account, in a modified form, for the filling of the stamp cavities during the imprint process, they predict significant non-uniformity of the residual layer in areas with different pattern densities. This phenomenon is even intensified by the different imprint velocities of structures with different pattern sizes. The residual layers achieved and their uniformity strongly depend on the pattern sizes and cavity sizes of the stamp. Non-uniformities are lower under cavity filling on the cost of the absolute value of the residual height. In some cases the layout of a device can in parts be adapted to the imprint process by segmentation of larger structures without changing the device functionality. When the segmentation is designed in a way, that its pattern density is similar to the major pattern density within the functional area of the device thin and uniform residual layers are achieved after very short imprint times.

【摘要机译】压印成薄层的过程可以用挤压流动方程来描述。如果他们以修改的形式考虑到压印过程中压模腔的填充,则他们会预测在具有不同图案密度的区域中残留层的明显不均匀性。具有不同图案尺寸的结构的不同压印速度甚至加剧了这种现象。所获得的残余层及其均匀性在很大程度上取决于印模的图案尺寸和空腔尺寸。在空洞填充下,不均匀性降低的代价是剩余高度的绝对值。在某些情况下,设备的布局可以通过分割较大的结构而部分地适合压印过程,而无需更改设备的功能。当以某种方式设计分段时,其图案密度类似于设备功能区域内的主要图案密度,并且在很短的压印时间后即可实现薄且均匀的残留层。

【作者】Nicolas Bogdanski;Matthias Wissen;Hella-Christin Scheer;

【作者单位】Faculty of Electrical, Information Media Engineering, University of Wuppertal, Rainer-Gruenter-Strasse 21, D-42119 Wuppertal, Germany;

【年(卷),期】2005(),

【年度】2005

【页码】P.282-289

【总页数】8

【原文格式】PDF

【正文语种】eng

【中图分类】TB85;TN305.7;

【关键词】nanoimprint;hot embossing;non-uniformity;residual layer;

机译 纳米压印;热压纹;不均匀;残留层;
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