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【24h】Lithography Trends based on Projections of the ITRS

机译基于ITRS预测的光刻趋势

【摘要】The microelectronic industry has gone through an enormous technical evolution in the last four decades. Both the technological and economic challenges of microelectronics were increasing consistently in the past few years. This paper discusses the future trends in micro-and nano-technologies with special emphasis on lithography. The trends of miniaturization will be sketched with reference to the International Technology Roadmap for Semiconductors (ITRS). After a description of general trends in technology node timing, an overview will be given on the future lithography requirements and the technical solutions including options for post-optical lithography as, for example, Extreme UV.

【摘要机译】在过去的四十年中,微电子行业经历了巨大的技术发展。在过去的几年中,微电子学的技术和经济挑战都在不断增加。本文讨论了微技术和纳米技术的未来趋势,其中特别强调了光刻技术。微型化的趋势将参考国际半导体技术路线图(ITRS)进行草绘。在描述了技术节点时序的一般趋势之后,将概述未来的光刻要求和技术解决方案,包括后光学光刻的选项,例如Extreme UV。

【作者】Wolfgang Arden;

【作者单位】Infineon Technologies, Munich, Germany;

【年(卷),期】2005(),

【年度】2005

【页码】P.205-211

【总页数】7

【原文格式】PDF

【正文语种】eng

【中图分类】TB85;TN305.7;

【关键词】

机译 在过去的四十年中,微电子行业经历了巨大的技术发展。;
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