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【24h】High Speed Reflectometer for EUV Mask-Blanks

机译用于EUV掩模空白的高速反射仪

【摘要】AIXUV GmbH and partners have developed a high speed Reflectometer for EUV mask-blanks which is fully compliant with the SEMI-standard P38 for EUV-mask-blank metrology. The system has been installed in June 2004 at SCHOTT Lithotec AG It features high throughput, high lateral and spectral resolution, high reproducibility and low absolute uncertainty. Using AIXUV's EUV-LAMP and debris mitigation, low cost-of-ownership and high availability is expected. The spectral reflectance of up to 3 mask-blanks per hour can be measured with at least 20 spots each. The system is push button-controlled. Results are stored in CSV file format. For a spot size of 0.1x1 mm~2, 2000 spectral channels of 1.6 pm bandwidth are recorded from 11.6 nm to 14.8 nm. The reflectance measurement is based on the comparison of the sample under test to two reference mirrors calibrated at the PTB radiometry laboratory at BESSY II. The three reflection spectra are recorded simultaneously. For each spot more than 10~7 photons are accumulated in about 20 s, providing statistical reproducibility below 0.2 % RMS. The total uncertainty is below 0.5 % absolute. Wavelength calibration better than 1 pm RMS over the whole spectral range is achieved by reference to NIST published wavelengths of about 100 xenon emission lines. It is consistent with the wavelength of the krypton 3d-5p absorption resonance at 13.5947 nm to better than 2 pm.

【摘要机译】AIXUV GmbH及其合作伙伴已经开发出一种用于EUV掩模空白的高速反射仪,该反射仪完全符合用于EUV掩模空白计量的SEMI标准P38。该系统已于2004年6月安装在SCHOTT Lithotec AG上。它具有高通量,高横向和光谱分辨率,高重现性和低绝对不确定性的特点。通过使用AIXUV的EUV-LAMP和减缓碎片,可以预期拥有成本低,可用性高。每小时最多可测量3个空白的光谱反射率,每个光谱至少有20个斑点。该系统由按钮控制。结果以CSV文件格式存储。对于0.1x1 mm〜2的光斑大小,记录了从11.6 nm到14.8 nm的2000个光谱通道,带宽为1.6 pm。反射率测量基于被测样品与在BESSY II的PTB辐射实验室进行校准的两个参考镜的比较。同时记录三个反射光谱。对于每个斑点,在约20 s内累积了10〜7个以上的光子,在0.2%RMS以下提供了统计可重复性。总不确定度低于绝对值的0.5%。通过参考NIST发布的约100个氙发射线的波长,可以在整个光谱范围内实现优于1 pm RMS的波长校准。它与3 3d-5p吸收共振的波长在13.5947 nm到大于2 pm一致。

【作者】C. Wies;R. Lebert;B. Jaegle;L. Juschkin;F. Sobel;H. Seitz;R. Walter;C. Laubis;F. Scholze;W. Biel;O. Steffens;

【作者单位】AIXUV GmbH, Steinbachstrasse 15, D-52074 Aachen, Germany;

【年(卷),期】2005(),

【年度】2005

【页码】P.252-262

【总页数】11

【原文格式】PDF

【正文语种】eng

【中图分类】TB85;TN305.7;

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