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【24h】Gaussian beam writing strategy: Accuracy of using the Shape Beam simulator SELID™ for Gaussian Beam Systems

机译高斯光束写入策略:将形状光束模拟器SELID™用于高斯光束系统的准确性

【摘要】Obtaining highly aggressive resolution with E-Beam direct writing needs accurate simulation tools. SIGMA-C software SELID™ allows simulating patterns profiles transferred into a resist film in the case of a Shaped Beam system. However E-Beam tools that allow achieving very high resolution, especially for dense patterns, are Gaussian Beam systems. This article deals with the comparison of experimental lines obtained with a Gaussian Beam writing system and with simulation by SELID™ of such lines. A negative chemically amplified photo resist (NEB22, Sumitomo) was exposed by our Leica UHR 100 keV. By using a high beam step size with a Gaussian spot 5 nm of FWHM (Full Width at Half Maximum), we showed that Shaped Beam simulations obtained with SELID™ are accurate compared to experiments.

【摘要机译】通过电子束直接写入获得极高的分辨率需要精确的仿真工具。 SIGMA-C软件SELID™可以模拟异形光束系统中转移到抗蚀剂膜中的图案轮廓。但是,允许实现非常高的分辨率(特别是对于密集图案)的电子束工具是高斯光束系统。本文将对使用高斯束写入系统获得的实验线进行比较,并通过SELID™对这些线进行仿真。负化学放大的光刻胶(NEB22,住友)通过我们的Leica UHR 100 keV曝光。通过使用高光束步长和5W高斯点的FWHM(半峰全宽),我们证明了与实验相比,用SELID™获得的成形光束模拟是准确的。

【作者】J.H. Tortai;J. Thiault;R. Tiron;L. Mollard;Stephan Haefele;Sergey Vychub;John Lewellen;Peter Brooker;

【作者单位】LTM, CNRS, 17 rue des martyrs, 38054 Grenoble cedex 9, France;

【年(卷),期】2005(),

【年度】2005

【页码】P.82-88

【总页数】7

【原文格式】PDF

【正文语种】eng

【中图分类】TB85;TN305.7;

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