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【24h】High Speed Actinic EUV Mask Blank Inspection with Dark-Field Imaging

机译带有暗场成像的高速光化EUV掩模空白检测

【摘要】We proposed an actinic (at-wavelength) EUV mask blank inspection method providing a printable phase-defect detection capability within the whole area of the mask blanks in an allowable inspection time. The inspection tool based on our method consists of optics for illuminating a mask blank with an EUV light, a mask blank stage, Schwarzschild optics for dark-field imaging, and a CCD camera. Phase-defect detection experiments were performed using a 10 Hz LPP source and with 0.2 NA imaging optics with the center obscuration NA of 0.1. Two-dimensional dark field image signal of 0.5 mmXO.5 mm area was captured by the CCD camera with 1M pixels and the phase-defects with the size down to 70 nm were successfully detected. In addition, a programmed phase defect and natural defect with 2 nm height were clearly detected. Inspection time including image capture and data processing for 0.5 mmX0.5 mm area was approximately 2 second. This is equivalent to an inspection time of 800 seconds/cm~2. Inspection speed will increase by more than 10 times when combined with high power light source and high speed data acquisition. Although further optimization is needed, possibility of actinic inspection of EUV mask blanks within a practical inspection time has been demonstrated.

【摘要机译】我们提出了一种光化(波长)EUV掩模坯料检查方法,该方法可在允许的检查时间内在掩模坯料的整个区域内提供可打印的相缺陷检测功能。基于我们的方法的检查工具包括用EUV灯照明口罩毛坯的光学器件,口罩毛坯载物台,用于暗场成像的Schwarzschild光学器件和CCD相机。使用10 Hz LPP源和0.2 NA成像光学元件(中心暗度NA为0.1)进行相缺陷检测实验。用1M像素的CCD相机捕获了0.5 mmX0.5 mm区域的二维暗场图像信号,并成功检测到尺寸低至70 nm的相位缺陷。此外,清楚地检测到编程的相位缺陷和2 nm高的自然缺陷。 0.5 mmX0.5 mm区域的包括图像捕获和数据处理在内的检查时间约为2秒。这相当于检查时间为800秒/ cm〜2。结合大功率光源和高速数据采集,检查速度将提高10倍以上。尽管需要进一步优化,但是已经证明了在实际检查时间内对EUV掩模板进行光化检查的可能性。

【作者】Tsuneo Terasawa;Yoshihiro Tezuka;Masaaki Ito;Toshihisa Tomie;

【作者单位】MIRAI-Association of Super-Advanced Electronics Technologies (ASET) (Japan), AIST Tsukuba SCR, 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan;

【年(卷),期】2005(),

【年度】2005

【页码】P.xiii-xx

【总页数】8

【原文格式】PDF

【正文语种】eng

【中图分类】TB85;TN305.7;

【关键词】multilayer;mask blank;actinic inspection;EUV;phase defect;at-wavelength inspection;

机译 多层;掩模坯料;光化检查; EUV;相缺陷;波长检查;
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